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dc.contributor.authorNandan, Keshari
dc.contributor.authorToral López, Alejandro 
dc.contributor.authorMarin-Sanchez, Antonio
dc.contributor.authorGarcía Ruiz, Francisco Javier 
dc.contributor.authorGonzález Marín, Enrique 
dc.date.accessioned2020-12-21T11:49:41Z
dc.date.available2020-12-21T11:49:41Z
dc.date.issued2020
dc.identifier.citationNandan, K., Yadav, C., Rastogi, P., Toral-Lopez, A., Marin-Sanchez, A., Marin, E. G., ... & Chauhan, Y. S. (2020). Compact Modeling of Multi-Layered MoS 2 FETs Including Negative Capacitance Effect. IEEE Journal of the Electron Devices Society, 8, 1177-1183. [DOI 10.1109/JEDS.2020.3021031]es_ES
dc.identifier.urihttp://hdl.handle.net/10481/65070
dc.description.abstractAbstract—In this paper, we present a channel thickness dependent analytical model for MoS2 symmetric double-gate FETs including negative capacitance (NC) effect. In the model development, first thickness dependent model of the baseline 2D FET is developed, and later NC effect is included in the model using the Landau-Khalatnikov (L-K) relation. To validate baseline model behavior, density functional theory (DFT) calculations are taken into account to obtain numerical data for the K and valley dependent effective masses and differences in the energy levels of N-layer (N = 1, 2, 3, 4, and 5) MoS2. The calculated layer dependent parameters using DFT theory are further used in a drift-diffusion simulator to obtain electric characteristics of the baseline 2D FET for model validation. The model shows excellent match for drain current and total gate capacitance of baseline FET and NCFET against the numerical simulation. Index Terms—Metal-oxide-semiconductor field-effect transistor (MOSFET), Compact modeling, molybdenum disulfide (MoS2), transition metal dichalcogenide (TMD), Double Gate (DG), Negative Capacitance FET (NCFET).es_ES
dc.description.sponsorshipSwarnajayanti Fellowshipes_ES
dc.description.sponsorshipFIST Scheme of Department of Science and Technology (DST), Government of Indiaes_ES
dc.description.sponsorshipSpanish Government Grant FPU16/04043es_ES
dc.description.sponsorshipJuan de la Cierva Incorporación (MINECO/AEI) IJCI-2017-32297es_ES
dc.language.isoenges_ES
dc.publisherIEEE-INST Electrical Electronics Engineers INCes_ES
dc.rightsAtribución 3.0 España*
dc.rights.urihttp://creativecommons.org/licenses/by/3.0/es/*
dc.titleCompact Modeling of Multi-layered MoS2 FETs including Negative Capacitance Effectes_ES
dc.typeinfo:eu-repo/semantics/articlees_ES
dc.rights.accessRightsinfo:eu-repo/semantics/openAccesses_ES
dc.identifier.doi10.1109/JEDS.2020.3021031
dc.type.hasVersioninfo:eu-repo/semantics/publishedVersiones_ES


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Atribución 3.0 España
Except where otherwise noted, this item's license is described as Atribución 3.0 España