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dc.contributor.authorRomero Maldonado, Francisco Javier 
dc.contributor.authorToral López, Alejandro 
dc.contributor.authorOhata, Akiko
dc.contributor.authorMorales Santos, Diego Pedro 
dc.contributor.authorGarcía Ruiz, Francisco Javier 
dc.contributor.authorGodoy Medina, Andrés 
dc.contributor.authorRodríguez Santiago, Noel 
dc.date.accessioned2020-05-07T09:57:08Z
dc.date.available2020-05-07T09:57:08Z
dc.date.issued2019-06-19
dc.identifier.citationRomero, F.J.; Toral-Lopez, A.; Ohata, A.; Morales, D.P.; Ruiz, F.G.; Godoy, A.; Rodriguez, N. Laser-Fabricated Reduced Graphene Oxide Memristors. Nanomaterials 2019, 9, 897. [doi:10.3390/nano9060897]es_ES
dc.identifier.urihttp://hdl.handle.net/10481/61865
dc.description.abstractFinding an inexpensive and scalable method for the mass production of memristors will be one of the key aspects for their implementation in end-user computing applications. Herein, we report pioneering research on the fabrication of laser-lithographed graphene oxide memristors. The devices have been surface-fabricated through a graphene oxide coating on a polyethylene terephthalate substrate followed by a localized laser-assisted photo-thermal partial reduction. When the laser fluence is appropriately tuned during the fabrication process, the devices present a characteristic pinched closed-loop in the current-voltage relation revealing the unique fingerprint of the memristive hysteresis. Combined structural and electrical experiments have been conducted to characterize the raw material and the devices that aim to establish a path for optimization. Electrical measurements have demonstrated a clear distinction between the resistive states, as well as stable memory performance, indicating the potential of laser-fabricated graphene oxide memristors in resistive switching applications.es_ES
dc.description.sponsorshipThis work has been supported by the Spanish Ministry of Science, Innovation and Universities/FEDER-EU through the project TEC2017-89955-P, Iberdrola Foundation under its 2018 Research Grant Program, the pre-doctoral grants FPU16/01451, FPU16/04043, and the JSPS KAKENHI through grant number JP18k04275.es_ES
dc.language.isoenges_ES
dc.publisherMDPIes_ES
dc.rightsAtribución 3.0 España*
dc.rights.urihttp://creativecommons.org/licenses/by/3.0/es/*
dc.subjectMemristores_ES
dc.subjectGraphene oxidees_ES
dc.subjectLaser-scribinges_ES
dc.subjectNeuromorphices_ES
dc.subjectFlexible Electronicses_ES
dc.titleLaser-Fabricated Reduced Graphene Oxide Memristorses_ES
dc.typeinfo:eu-repo/semantics/articlees_ES
dc.rights.accessRightsinfo:eu-repo/semantics/openAccesses_ES
dc.identifier.doi10.3390/nano9060897


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