Numerical study of p-type InSb and GaSb nanowires

Abstract

III-V nanowires (NWs) have attracted extensive research interests in recent years because of their unique physical properties, being recognized as promising building blocks for the next generation of electronics and photonics. Most of the works up-to-date are, however, focused on n-type devices where materials such as InAs or InGaAs have already demonstrated impressive performance. Nevertheless, for the practical implementation of CMOS circuits based on NWs, p- channel FETs are mandatory. Several materials are currently being investigated as technologically relevant p-type semiconductors. In particular, increasingly more attention has been focused on InSb and GaSb NWs owing to their excellent hole transport properties. In this work we study the electrostatic properties of traditional p-type NWs based on Si and Ge compared to III-V materials.