Gate capacitance performance of p-type InSb and GaSb nanowires
Identificadores
URI: http://hdl.handle.net/10481/58489Metadata
Show full item recordAuthor
Martínez Blanque, Celso Jesús; García Ruiz, Francisco Javier; Donetti, Luca; Toral López, Alejandro; González-Medina, Jose María; González Marín, Enrique; Godoy Medina, Andrés; Gámiz Pérez, Francisco JesúsMateria
III-V semiconductors P-type semiconductors Gate capacitance
Date
2017-04-05Sponsorship
This work was supported by the Spanish Government under the Project TEC2014-59730-R. C. Martínez-Blanque acknowledges the Junta de Andalucía support under project P09-TIC4873.Abstract
The electrostatic behavior of p-type nanowires
made of antimonide III-V materials (InSb and GaSb) is
analyzed by means of a self-consistent solution of the
Poisson and Schrödinger equations, under the k·p
approximation. The results are compared to those achieved
for Si and Ge NWs, and the contribution of each of the
capacitance terms (quantum and inversion layer
capacitances) is thoroughly analyzed.