Effect of Hydrofluoric Acid Etching Time on Titanium Topography, Chemistry, Wettability, and Cell Adhesion Zahran, R. Rosales Leal, Juan Ignacio Rodríguez Valverde, Miguel Ángel Cabrerizo Vílchez, Miguel Ángel Titanium implant surface etching has proven an effective method to enhance cell attachment. Despite the frequent use of hydrofluoric (HF) acid, many questions remain unresolved, including the optimal etching time and its effect on surface and biological properties. The objective of this study was to investigate the effect of HF acid etching time on Ti topography, surface chemistry, wettability, and cell adhesion. These data are useful to design improved acid treatment and obtain an improved cell response. The surface topography, chemistry, dynamic wetting, and cell adhesiveness of polished Ti surfaces were evaluated after treatment with HF acid solution for 0, 2; 3, 5, 7, or 10 min, revealing a time-dependent effect of HF acid on their topography, chemistry, and wetting. Roughness and wetting increased with longer etching time except at 10 min, when roughness increased but wetness decreased. Skewness became negative after etching and kurtosis tended to 3 with longer etching time. Highest cell adhesion was achieved after 5-7 min of etching time. Wetting and cell adhesion were reduced on the highly rough surfaces obtained after 10-min etching time. 2024-10-07T11:02:22Z 2024-10-07T11:02:22Z 2016-11-08 journal article Zahran R, Rosales Leal JI, Rodríguez Valverde MA, Cabrerizo Vílchez MA (2016) Effect of Hydrofluoric Acid Etching Time on Titanium Topography, Chemistry, Wettability, and Cell Adhesion. PLoS ONE 11(11): e0165296. doi:10.1371/journal.pone.0165296 https://hdl.handle.net/10481/95635 10.1371/journal.pone.0165296 eng http://creativecommons.org/licenses/by/4.0/ open access Atribución 4.0 Internacional Plos One