Simulation of the phonon-limited electron mobility in multi-layer MoS 2 field-effect transistors

Abstract

We study the electron mobility in Metal-Insulator-Semiconductor Field-Effect-Transistors which use multi-layer MoS 2 as channel. The electrostatic behavior is calculated by self-consistently solving the 1D Poisson and Schrödinger equations under the effective mass approximation. Phonon-limited electron mobility is then calculated solving the Boltzmann Transport Equation under the Momentum Relaxation Time approximation for different device sizes and bias conditions.