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dc.contributor.authorRubio Andrés, Antonio
dc.contributor.authorBastos-González, Delfi
dc.contributor.authorFernández Rodríguez, Miguel Ángel
dc.date.accessioned2025-11-05T12:15:13Z
dc.date.available2025-11-05T12:15:13Z
dc.date.issued2025-10-02
dc.identifier.citationRubio-Andrés, A., Bastos-González, D., & Fernandez-Rodriguez, M. A. (2025). A guide to soft colloidal lithography: Advances in microgels at fluid interfaces, preparation methods and applications of 2D microgel monolayers. Advances in Colloid and Interface Science, 346(103684), 103684. https://doi.org/10.1016/j.cis.2025.103684es_ES
dc.identifier.urihttps://hdl.handle.net/10481/107792
dc.description.abstractNanostructured surfaces have gained significant attention over recent decades due to their diverse technological applications across multiple fields. The fabrication of artificial nanostructures typically relies on lithographic approaches, yet conventional lithography techniques face challenges related to scalability and high costs, prompting the emergence of soft colloidal lithography (SCL) as a promising alternative for designing large-scale crystalline nanostructures. SCL exploits the rapid and large scale self-assembly of microgels at fluid interfaces and their subsequent transfer to solid substrates. Despite its potential, SCL remains underused in most clean room facilities, hindering its implementation in industrial processes. This review addresses this gap by providing both soft matter and materials science communities with tools to effectively design SCL-based materials. We start presenting an updated overview of microgel behavior at fluid interfaces, which is the platform providing the better tools to tune the final monolayer pattern. We then present a comprehensive guidance on preparation procedures, encompassing both direct assembly methods and interface-assisted approaches. Finally, we review applications of SCL-fabricated materials, including those where deposited microgels serve as functional elements and those where monolayers function as either positive masks for nanowire fabrication or negative masks for nanohole production. Throughout the review, we identify promising research directions to advance the SCL technique and propose applications where this methodology could enhance existing technologies.es_ES
dc.description.sponsorshipMICIU/AEI/10.13039/501100011033 (Grants PID2020-116615RA-I00, PID2023-149387OB-I00, PID2023-147135OB-I00)es_ES
dc.description.sponsorshipJunta de Andalucía (EMERGIA EMC21_00008, C-ING-208-UGR23, PY20-00241, AFQM-90-UGR20)es_ES
dc.description.sponsorshipUniversidad de Granada - CBUA (Open Access Funding)es_ES
dc.language.isoenges_ES
dc.publisherElsevieres_ES
dc.rightsAtribución 4.0 Internacional*
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/*
dc.subjectSoft colloidal lithographyes_ES
dc.subjectSelf-assemblyes_ES
dc.subjectFluid interfaceses_ES
dc.titleA guide to soft colloidal lithography: Advances in microgels at fluid interfaces, preparation methods and applications of 2D microgel monolayerses_ES
dc.typejournal articlees_ES
dc.rights.accessRightsopen accesses_ES
dc.identifier.doi10.1016/j.cis.2025.103684
dc.type.hasVersionVoRes_ES


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