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dc.contributor.authorFumagalli, Laura
dc.contributor.authorEsfandiar, Ali
dc.contributor.authorFabregas, Rene
dc.contributor.authorHu, S
dc.contributor.authorAres, Pablo
dc.contributor.authorJanardanan, Amritha
dc.contributor.authorYang, Q
dc.contributor.authorRadha, Boya
dc.contributor.authorTaniguchi, Takashi
dc.contributor.authorWatanabe, K
dc.contributor.authorGomila, Gabriel
dc.contributor.authorK. Geim, Andre
dc.contributor.authorS. Novoselov, Konstantin
dc.date.accessioned2025-02-03T07:05:17Z
dc.date.available2025-02-03T07:05:17Z
dc.date.issued2018
dc.identifier.urihttps://hdl.handle.net/10481/101797
dc.description.abstractThe dielectric constant e of interfacial water has been predicted to be smaller than that of bulk water (e ≈ 80) because the rotational freedom of water dipoles is expected to decrease near surfaces, yet experimental evidence is lacking. We report local capacitance measurements for water confined between two atomically flat walls separated by various distances down to 1 nanometer. Our experiments reveal the presence of an interfacial layer with vanishingly small polarization such that its out-of-plane e is only ~2.The electrically dead layer is found to be two to three molecules thick. These results provide much-needed feedback for theories describing water-mediated surface interactions and the behavior of interfacial water, and show a way to investigate the dielectric properties of other fluids and solids under extreme confinement.es_ES
dc.language.isoenges_ES
dc.rightsAttribution-NonCommercial-NoDerivatives 4.0 Internacional*
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/4.0/*
dc.subjectConfined Wateres_ES
dc.subjectDielectric Constantes_ES
dc.subjectInterfacial Wateres_ES
dc.subjectNanoconfinementes_ES
dc.subjectCapacitance Measurementses_ES
dc.subject2D Materialses_ES
dc.subjectAFMes_ES
dc.titleAnomalously low dielectric constant of confined wateres_ES
dc.typejournal articlees_ES
dc.rights.accessRightsopen accesses_ES
dc.identifier.doi10.1126/science.aat4191
dc.identifier.doi10.48550/arXiv.1806.04486


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